Desktop Developing Equipment
The desktop developing equipment is cost-effective, has good stability and repeatability, and has very ideal effects on the development process.
Stock Status:
On The Way
Description
Coating and development are a vital role in semiconductor production. In the complex process of semiconductor manufacturing, the coating and developing equipmnet is an important part of the lithography process. It is used in conjunction with the exposure equipment to complete the delicate lithography process. .
Features
- Fully enclosed development prevents fog from spreading to the outside and polluting the environment.
- It adopts corrosion-resistant shell and is easy to clean.
- The inner cavity is made of stainless steel, mirror polished, smooth, corrosion-resistant and easy to clean.
- Built-in vacuum screening program to prevent liquid from being sucked into the vacuum pump.
- The vacuum pressure is adjustable and the pressure value is displayed instantly.
- The liquid flow rate is adjustable and the back suction is adjustable.
| [Applicable wafer size]: | 10mm to 200mm (8" wafer) |
| [Speed resolution]: | ±1 RPM |
| [Coating speed]: | 20~3000rpm (without loading) |
| [Coating acceleration]: | 20~10,000rpm/sec(without loading) |
| [Time setting]: | 1~3,000sec/step, time setting accuracy |
| [3-channel developer]: | 1 developer, 1 pure water, 1 nitrogen |
| [Program]: | Single-step or multi-step program optional, built-in 100 group of editable programs |
